| Computation of sensitivities of IC interconnect parasitic capacitances to the process variation with dual discrete geometric methods |
| 高展;任但;闫帅;徐小宇;任卓翔; |
| 关键词：capacitance extraction;dual discrete geo |
| 主要内容：Sensitivity analysis methods help to deal with the challenges of process variation in extraction of parasitic capacitanc |
| 《Journal of Semiconductors》 2016,37(08):94-100 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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