| Synergetic effect of chelating agent and nonionic surfactant for benzotriazole removal on post Cu-CMP cleaning |
| 李彦磊;刘玉岭;王辰伟;李月; |
| 关键词：post Cu-CMP;alkaline cleaning solution;B |
| 主要内容：The cleaning of copper interconnects after chemical mechanical planarization(CMP) process is a critical step in integrat |
| 《Journal of Semiconductors》 2016,37(08):101-106 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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