| Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction |
| Jun Zhu;David Wei Zhang;Chinte Kuo;Qing |
| 关键词：integrated circuits;OPC;source optimizat |
| 主要内容：As technology node shrinks, aggressive design rules for contact and other back end of line(BEOL)layers continue to drive |
| 《Journal of Semiconductors》 2017,38(07):87-92 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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