| Effect of Wafer Size on the Film Internal Stress Measurement by Wafer Curvature Method |
| 江帆;CHEN Shang;冷永祥;HUANG Nan; |
| 关键词：film;internal stress;wafer curvature method;wafer |
| 主要内容：Wafer curvature method has been applied to determine the internal stress in the films using Stoney's equation.During the film deposition,the wafer fix |
| 《JWUT(Materials Science)》 2016(1).93-99 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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