| Fabrication of iridium oxide neural electrodes at the wafer level |
| ZHANG He;PEI WeiHua;ZHAO ShanS |
| 关键词：reactive ion sputtering;iridium oxide;wafer-level; |
| 主要内容：Electro-deposition, electrical activation, thermal oxidation, and reactive ion sputtering are the four primary methods to fabricate iridium oxide film |
| 《Science China(Technological Sciences)》 2016(9).1399-1406 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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