| Simulation of Temperature Distribution in Hot Filament Chemical Vapor Deposition |
| 刘建锦;王亮;张建国;沈彬;孙方宏; |
| 关键词：finite volume method;substrate temperature;hot fil |
| 主要内容：In this study, the temperature and gas velocity distributions in hot filament chemical vapor deposition(HFCVD) diamond film growth on the end surfaces |
| 《Journal of Shanghai Jiaotong University》 2016(5).541-547 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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