| Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si |
| ManBao－Yuan[1] LiuAi－Hua[2] 等 |
| 关键词：金属铝 半导体硅 脉冲激光烧蚀 表面损伤 |
| 主要内容：The suraface morphological changesd produced by Nd:YAG pulsed laser ablation of metal Al and semiconductor Si were carefully examined and analyzed by using scanning elkectron microscope.The formation mechanism of the droplets was discussed.and the reasons for formation of the microcracks on the laser irradiated area of the target surface were analyzed by calculating the thermal stress,the vapor pressure and the shock pressure induced by the laser supported detonation. |
| 《核技术：英文版》 1998,9(2).-98-101 |
| 全文下载请进入http://hightech.stlib.cn/tpi_1/sysasp/include/index.asp |
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